2005年

“Formation of Single-crystalline Silicon Layers on Insulator Islands using Selective Epitaxial Growth and Laser”,

H.S. Cho, W.X. Xianyu, Silicon-on-Insulator Technology and Devices XII, p.243, 2005.

“Low temperature Poly-Si TFT on plastic substrates”,

J.Y. Kwon, D.Y. Kim, H.S. Cho, K.B. Park, J.S. Jung, J.M. Kim, Y.S. Park , T. Noguchi, IEICE TRANS ELE vol.E88-C, 4, p.667, 2005.

“Low Temperature process for Advanced Si TFT Technology”,

T. Noguchi, J.Y. Kwon, J.S. Jung, , J.M. Kim, K.B. Park, H. Lim, D.Y. Kim,H.S. Cho, X.X. Zhang, H.X. Yin, W.X. Xianyu, Dig. of Tech. Papers AM-LCD’05, TFT2-2, 281-284, 2005.

“High performance poly-Si thin film transistor on plastic substrate”,

D. Y. Kim, J. Y. Kwon, J. S. Jung, J. M. Kim, K. B. Park, H. Lim, H. S. Cho, T. Noguchi, TFT2-2, p.299, 2005.

“A new approach of poly-Si film on plastic substrate prepared by ion beam deposition (IBD) followed by excimer laser crystallization at room temperature for flexible”,

J. Y. Kwon, H. Lim, K. B. Park, J. S. Jung, D. Y. Kim, H. S. Cho, S. P. Kim, Y. S. Park, J. M. Kim, T. Noguchi, TFTp2-1, p199, 2005.

“Characterization of poly-Si TFT array on plastic substrate for AMOLED”

J.Y. Kwon, D.Y. Kim, J.S. Jung, J.M. Kim, H. Lim, K. B. Park, H.S. Cho, X. Zhang, H. Yin, W. Xianyu, T. Noguchi, IDW’05, AMDp-22, p.1133, 2005.

“The effect of the buffer SiO2 on plastic substrate for laser crystallization of Si films”

J. S. Jung, D. Y. Kim, J. M. Kim, J. Y. Kwon, K. B. Park, H. Lim, and T. Noguchi, IDW’05, AMDp-25, p.1145, 2005.

“Oxygen effect on laser crystallization of sputtered a-Si film on plastic substrate”

J.M. Kim, D. Y. Kim, J. S. Jung, J. Y. Kwon, K. B. Park, H. Lim, and T. Noguchi, IDW’05, AMDp-27, p.1153, 2005.

“The fabrication of the p-type Ultra Low Temperature TFT under 200oC”

H. Lim, K.B. Park, H. Yin, W. Xianyu, J.Y. Kwon, X. Zhang, Hans. S. Cho, J.M. Kim, D.Y. Kim, J.S. Jung and T. Noguchi, IDW’05, AMDp-29, p.1159, 2005.

“Ultra-low temperature (below 100oC) Si TFT process

for flexible display”

K. Park, H. Lim, J. Kwon, J. Jung, D. Kim, J.Kim, and T. Noguchi, IDW’05, AMDp-50L, p.1225, 2005.

“Ultra low sheet resistance on poly silicon film by Excimer laser activation”

Hyuck Lim, Huaxiang Yin, Wenxu Xianyu, Jang-Yeon Kwon1 Xiaoxin Zhang,Hans. S. Cho, Jong-Man Kim, Kyung-Bae Park, Do Young Kim, Ji-Sim Jung1and Takashi Noguchi, 38.3 / H. Lim, 1112 · IMID ’05 DIGEST, 2005.

“Laser Crystallization of a-Si:H films prepared at Ultra Low

Temperature(<150°C) by Catalytic CVD”

Sung-Hyun Lee, Wan-Shick Hong, Jong-Man Kim1 Hyuck Lim, Kuyng-Bae Park, Chul-Lae Cho, Kyung-Eun Lee, Do-Young Kim, Ji-Sim Jung, Jang-Yeon Kwonand Takashi Noguch, 38.4 / S. H. Lee , 1116 · IMID ’05 DIGEST, 2005.

“High Performance Poly-Si TFT (μ>290cm2/Vsec) Direct Fabricated

on Plastic Substrate below 170oC”

Jang Yeon Kwon, Do Young Kim, Ji Sim Jung, Jong Man Kim, Hyuck Lim, Kyung Bae Park , Hans. S. Cho, Xiaoxin Zhang, Huaxiang Yin, Wenxu Xianyu and Takashi Noguchi, 7.4 / J. Y. Kwon, IMID ’05 DIGEST • 149, 2005.

“Low Temperature Processes of Poly-Si TFT Backplane for Flexible AM-OLEDs”

Wan-Shick Hong, Sung-Hyun Lee, Chul-Lae Cho, Kyung-Eun Lee, Sae-Bum Kim, Jongman Kim, Jang-Yeon Kwon, Takashi Noguchi, 23.2 / W.S.Hong, IMID ’05 DIGEST • 785, 2005.

“HfO₂ Gate Insulator Formed by Atomic Layer Deposition for Thin-Film-Transistors”,

S.-W. Jeong, H. J. Lee, K. S. Kim, M. T. You, Y. Roh, T. Noguchi, W. Xianyu, J. Jung, 2005 Dry Process International Symposium, 5-58, p.143, Korea, 2005.

“Ultra-low temperature process by lon shower Technique for poly-Si TFT on plastic”

Jong-Man Kim, Wan-Shick Hong, Hyuck Lim, Do-Young Kim, Ji-Sim Jung, Jang-Yeon Kwon, T. Noguchi, ITC’2005, P9, p.123, 2005.

“Study of HfO₂ high –k gate oxide for low temperature poly Si TFT”

J. S. Jung, J. Y. Kwon, W. Xianyu, S. H. Jeong, S. Won, Jeong, Y. H. Roh, T. Noguchi, ITC’2005, P10, p.126, 2005.

“Ultra low sheet resistance on poly silicon film by Excimer laser activation”

H. Lim, H. Yin, W. Xianyu, J. Y. Kwon, X. Zhang, H. S. Cho, J. M. Kim, K. B. Park, D. Y. Kim, J. S. Jung, T. Noguchi, ITC’2005, 6.4, p.170, 2005.

“Ultra-Low temperature poly-Si thin film transistor for plastic substrate”

D. Y. Kim, J. Y. Kwon, J. S. Jung, K.B. Park, Hans S. Cho, H. Lim, J. M. Kim, H. Yin, X. Zhang, T. Noguchi, ITC’2005, 9.4, p.242, 2005.